Sample interview questions: Have you ever utilized electron beam lithography in your experiments? If yes, describe the applications and challenges.
Sample answer:
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Applications of Electron Beam Lithography:
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Fabrication of Nanostructures: Electron beam lithography is capable of creating intricate nanostructures with precise dimensions and geometries. This makes it an essential tool for various fields, including nanotechnology, electronics, and optics.
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Circuit Fabrication: It is widely employed in the fabrication of integrated circuits (ICs) and other electronic devices. The high resolution and accuracy of electron beam lithography enable the creation of extremely small and dense circuit patterns.
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Mask Making: Electron beam lithography can be used to create masks for photolithography, a widely used technique for transferring patterns onto wafers in semiconductor manufacturing.
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Research and Development: Electron beam lithography is also used in various research and development activities, such as studying the properties of materials at the nanoscale, developing new materials, and exploring novel device concepts.
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Challenges in Electron Beam Lithography:
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Cost and Complexity: Electron beam lithography systems are expensive and require specialized expertise to operate. This limits its accessibility and broad adoption.
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Throughput: Electron beam lithography is a relatively slow process, making it impractical for high-volume production. This is because the electron beam must be scanned across the entire surface of the substrate, which can be time-consuming, especially for large patterns.
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Substrate Damage: The high-energy electron beam can … Read full answer